Cleaning of Capped Multi-Layer Samples and Cleaning with Hydrogen using the Evactron® De-Contaminator
Christopher G. Morgan and Ronald Vane*, XEI Scientific, Inc., 1755 E. Bayshore Blvd., Redwood City, CA Presentation at the EUV Lithography Workshop, June 2011, Maui, Hawaii Carbon contamination on extreme ultraviolet (EUV) optics reduces their reflectivity. Further...Upcoming Events
Oct
19
Sat
all-day
Neuroscience 2019
@ McCormick Place
Neuroscience 2019
@ McCormick Place
Oct 19 – Oct 23 all-day
Neuroscience 2019, the 49th annual gathering of the Society for Neuroscience, will be held Oct. 19-23 in Chicago. This year’s meeting is expected to attract more than 30,000 industry professionals from over 80 countries. Attendees[...]
Nov
10
Sun
all-day
ISTFA 2019
@ Oregon Convention Center
ISTFA 2019
@ Oregon Convention Center
Nov 10 – Nov 14 all-day
ISTFA 2019 – The advent of Artificial Intelligence and the promise of quantum computing are driving disruptive computing architectures. Neuromorphic chip designs on one hand, and Quantum Bits on the other, still in R&D, will[...]
Dec
1
Sun
all-day
MRS Fall Meeting
@ Hynes Convention Center
MRS Fall Meeting
@ Hynes Convention Center
Dec 1 – Dec 6 all-day
The Materials Research Society (MRS) is an organization of materials researchers worldwide that promotes communication for the advancement of interdisciplinary materials research and technology to improve the quality of life. The 2019 MRS Fall Meeting[...]