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Removal of Surface Contamination from EUV Mirrors using Low-Power Downstream Plasma Cleaning

Removal of Surface Contamination from EUV Mirrors using Low-Power Downstream Plasma Cleaning

Christopher G. Morgan*, Patrick P. Naulleau**, Senajith B. Rekawa**, Paul E. Denham**, Brian H. Hoef**, Michael S. Jones**, and Ronald Vane*, *XEI Scientific, Inc., 1755 E. Bayshore Blvd., Redwood City, CA, **Center for X-Ray Optics (CXRO), Lawrence Berkeley National...
Cleaning of Capped Multi-Layer Samples and Cleaning with Hydrogen using the Evactron® De-Contaminator

Cleaning of Capped Multi-Layer Samples and Cleaning with Hydrogen using the Evactron® De-Contaminator

Christopher G. Morgan and Ronald Vane*, XEI Scientific, Inc., 1755 E. Bayshore Blvd., Redwood City, CA Presentation at the EUV Lithography Workshop, June 2011, Maui, Hawaii Carbon contamination on extreme ultraviolet (EUV) optics reduces their reflectivity. Further...

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