Christopher G. Morgan*, Patrick P. Naulleau**, Senajith B. Rekawa**, Paul E. Denham**, Brian H. Hoef**, Michael S. Jones**, and Ronald Vane*, *XEI Scientific, Inc., 1755 E. Bayshore Blvd., Redwood City, CA, **Center for X-Ray Optics (CXRO), Lawrence Berkeley National...
Christopher G. Morgan and Ronald Vane*, XEI Scientific, Inc., 1755 E. Bayshore Blvd., Redwood City, CA Presentation at the EUV Lithography Workshop, June 2011, Maui, Hawaii Carbon contamination on extreme ultraviolet (EUV) optics reduces their reflectivity. Further...