Cleaning of Capped Multi-Layer Samples and Cleaning with Hydrogen using the Evactron® De-Contaminator
Christopher G. Morgan and Ronald Vane*, XEI Scientific, Inc., 1755 E. Bayshore Blvd., Redwood City, CA Presentation at the EUV Lithography Workshop, June 2011, Maui, Hawaii Carbon contamination on extreme ultraviolet (EUV) optics reduces their reflectivity. Further...Upcoming Events
Dec
1
Sun
all-day
MRS Fall Meeting
@ Hynes Convention Center
MRS Fall Meeting
@ Hynes Convention Center
Dec 1 – Dec 6 all-day
The Materials Research Society (MRS) is an organization of materials researchers worldwide that promotes communication for the advancement of interdisciplinary materials research and technology to improve the quality of life. The 2019 MRS Fall Meeting[...]