Evactron U50 Plasma De-Contaminator™


The Evactron U50 De-Contaminator is a compact, high performance yet simplified plasma cleaner for instruments and chambers designed to operate at UHV conditions. The U50 delivers high power cleaning for removal of hydrocarbon contamination on chamber and sample surfaces.

The compact design of the Evactron U50 Plasma Radical Source (PRS) makes it a versatile solution for either instrument chambers, load locks, or sample prep chambers. The Evactron U50 offers fast, effective, and powerful cleaning over a wide range of pressures, enabling hydrocarbon-free RGA spectra and fast pumpdown time to UHV.

Evactron E50 TC
System Features
  • RF Power:  75W peak, up to 50W continuous
  • Dual action cleaning using plasma and UV afterglow
  • Energy efficient radio frequency hollow cathode plasma (RFHC)
  • Conflat 2.75 flange for UHV compatibility
  • Programmable power, cleaning time, number of cycles, recipes
  • Tethered touchpad command communications module
  • Wide range pressure operation: 0.3 Pa/ 2 mTorr  to 80 Pa/ 600 mTorr
  • Bakeable to 150⁰C
  • TMP compatible, no advance venting needed
  • Fast cleaning, 100X+  faster than earlier generation Evactron models
  • Non-damaging to sensitive components – no sputter etch
  • Leak tested to <10-11 Torr or 10-11 mBar (1.3E-9 Pa)
  • Push button cleaning operation
  • No match or gas flow adjustments needed for plasma ignition
  • TUV, NRTL, SEMI, CE and RoHS compliant
Evactron U50 System Specifications:
  • Evactron U50 plasma radical source
  • Desktop controller with pushbutton operation
  • Tethered touchpad communication package
  • Hardware interlock
  • Chassis dimensions: W×H×D: 17.2”×3.5”×8.6”
    (44×8.9×22 cm)
  • RF Power: 35 – 75 Watts at 13.56 MHz RFHC
  • 100-240 VAC 50/60 Hz input
  • RoHS Compliant
Evactron E50 TC