Effect of Cleaning Parameters on Cleaning Effectiveness in a SEM Equipped with an Oxygen Plasma Etching Device

R. Garcia*, A.D. Batchelor*, C.B. Mooney*, A.D. Garetto*, V.L. Carlino**, R. Vane**, and D.P. Griffiths *Materials Science and Engineering Department and Analytical Instrumentation Facility, North Carolina State University, Raleigh, NC; **XEI Scientific, Redwood City, CA 94063
Poster Presentation at Microscopy and Microanalysis Meeting, August, 2007, Ft. Lauderdale, FL