Christopher G. Morgan and Ronald Vane, XEI Scientific, Inc., Redwood City, CA
Poster Presentation at Microscopy and Microanalysis Meeting, August 2008, Albuquerque, NM.

Using a quartz crystal microbalance (QCM), the effectiveness of the Evactron® process has been quantified in this study, as a function of cleaning parameters such as chamber pressure during cleaning, RF power, and distance from the plasma source. The QCM measurements can now be extended in order to consider the effect of different gas mixtures and chamber geometries on cleaning.

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