Evactron® E50 Plasma De-Contaminators™

SEM AND FIB VACUUM CHAMBER CLEANING SYSTEM

The Evactron E50 De-Contaminators are compact, high performance yet simplified plasma cleaners for Electron and Ion Beam Instruments such as SEMs, TEMs, and FIBs. The E50 delivers high power cleaning for superior resolution and imaging plus improved detector and probe sensitivity that are compromised by contamination.
The compact design of the Evactron E50 Plasma Radical Source makes it a versatile solution for either SEM/FIB chambers, load locks, or sample prep chambers. The Evactron E50 Plasma Cleaners offer fast, effective, and powerful cleaning over a wide range of pressures enabling high quality, artifact free images and increased efficiency of sample analysis.

The compact design of the Evactron E-Series Plasma Radical Source makes it a versatile solution for either SEM/FIB chambers, load locks, or sample prep chambers. The Evactron E-Series Plasma Cleaners offer fast, effective, and gentle cleaning over a wide range of pressures enabling high quality, artifact free images and increased efficiency of sample analysis.

System Features
  • RF Power: 75W peak, 50W continuous
  • Dual action cleaning using plasma and UV afterglow
  • Energy efficient hollow cathode, capacitive coupled plasma (CCP)
  • “Pop” ignition (patent pending) at high vacuum
  • Programmable power, cleaning time, number of cycles, recipes
  • Android tablet with Bluetooth communication or touchpad communication
  • Wide range pressure operation: 0.3 Pa/ 2 mTorr to 80 Pa/ 600 mTorr
  • Optional external interlock connection
  • TMP compatible, no advance venting needed
  • Fast cleaning, 100X+ faster than earlier generation Evactron models
  • Non-damaging to sensitive components – no sputter etch
  • PRS can be installed on the SEM chamber or the load lock
  • Push button cleaning operation
  • No match or gas flow adjustments needed for plasma ignition
  • RoHS, CE, NRTL, TUV and SEMI S2 compliant

Evactron® E50 Plasma De-Contaminator™

The Evactron E50 Plasma De-contaminator was designed to remove hydrocarbon contamination from vacuum chambers such as SEMs, FIBs, TEMs, XPS and semiconductor equipment including CD-SEMs, ALD and EUVL. Its compact design fits all models of FIB/SEM chambers and loadlocks to provide in-situ sample cleaning. Evactron plasma cleaning shortens pumpdown time, maintains the ultimate vacuum level of your system and increases sample throughput with powerful yet thorough contamination removal.

 

Evactron E50 System Specifications:
  • Remote hollow cathode plasma radical source
  • Desktop controller with pushbutton operation
  • Android tablet with Bluetooth communication
  • Library of tested recipes and options to change power, cycles, length of cleaning, etc.
  • Chassis dimensions WxHxD: 17” x 3.4” x 6.7” (43 cm x 8.6 cm x 17 cm)
  • RF Power: 35 – 75 Watts at 13.56 MHz RFHC
  • 100-240 VAC 50/60 HZ input
  • RoHS, CE, NRTL, TUV and SEMI S2 compliant

Evactron® E50 E-TC Plasma De-Contaminator™

The Evactron E50 E-TC Plasma De-contaminator was designed for facilities that prefer a tethered touchpad interface for programming. Evactron plasma cleaners remove hydrocarbon contamination from vacuum chambers such as SEMs, FIBs, TEMs, XPS and semiconductor equipment including CD-SEMs, ALD and EUVL. Its compact design fits all models of FIB/SEM chambers and loadlocks to provide in-situ sample cleaning. Evactron plasma cleaning shortens pumpdown time, maintains the ultimate vacuum level of your system and increases sample throughput with powerful yet thorough contamination removal.

 

Evactron E50 E-TC System Specifications:
  • Remote hollow cathode plasma radical source
  • Desktop controller with pushbutton operation
  • Tethered touchpad communication
  • Library of tested recipes and options to change power, cycles, length of cleaning, etc.
  • Chassis dimensions WxHxD: 17”x3.4”x6.7” (43×8.6x17cm)
  • RF Power: 35 – 75 Watts at 13.56 MHz RFHC
  • 100-240 VAC 50/60 HZ input
  • RoHS, CE, NRTL, TUV and SEMI S2 compliant
Evactron E50 TC

Evactron® E50 E-TC Alternate Gas De-Contaminator™

The Evactron E50 E-TC Alternate Gas plasma cleaner has two configurations: an ultrahigh-purity filter (3nm pore size) version to meet the stringent requirements of the semiconductor industry SEMI F38-0699 directive and the precision filter (0.5µm pore size) version for general lab conditions. The in-line filters prevent the introduction of particulates from gas feedlines into the plasma stream. Alternate gases which have been tested include O2, CDA, Ar/ H2, Ar/O2, N2/H2, N2. The use of 100% H2 is not recommended for safety reasons.

 

Evactron E50 E-TC Alternate Gas System Specifications:
  • Remote hollow cathode plasma radical source
  • Desktop controller with pushbutton operation
  • Tethered touchpad communication
  • Library of tested recipes and options to change power, cycles, length of cleaning, etc.
  • Chassis dimensions WxHxD: 17”x3.4”x6.7” (43×8.6x17cm)
  • RF Power: 35 – 75 Watts at 13.56 MHz RFHC
  • 100-240 VAC 50/60 HZ input
  • RoHS, CE, NRTL, TUV and SEMI S2 compliant
Evactron E50 TC

Evactron® E50-OEM Plasma De-Contaminator™

The Evactron E50-OEM Plasma De-Contaminator was designed for OEM integration for SEM, FIB, high vacuum, and other analytical instruments. This simplified Evactron Plasma Radical Source (PRS) has a small footprint and utilizes air plasma afterglow to reduce hydrocarbon contamination, delivering results quickly and efficiently.

 

Evactron E50-OEM System Specifications:
  • SEM/FIB host directed control
  • 2U rack mount controller for system integration
  • Hardware interlock
  • Powerful compact Plasma Radical Source (PRS)
  • RF Power: 35 – 75 Watts at 13.56 MHz RFHC
  • 100-240 VAC 50/60 Hz input
  • RoHS Compliant