Products
Evactron® E25
Microprocessor-controlled plasma cleaning
The microprocessor based Evactron® E25 monitors plasma operation, has internal memory and is factory programmed to allow minimum operator training. The tabletop Evactron® E25 Controller uses a microprocessor with embedded software to regulate a leak valve and control the chamber pressure by a MicroPirani™ gauge. The microprocessor also regulates the RF power and has a clock to time the downstream plasma cleaning and nitrogen purging cycles. The microprocessor also records the operational and fault log. The Encoder Knob sets parameters in menus shown on the front panel display, and the Enable/Disable Button readies the Evactron® E25 for downstream plasma cleaning. The RS232 interface communicates operating parameters, forward and reflected RF power, vacuum level read outs, and operation/fault log between the Evactron® E25 and a remote computer through the provided Graphical User Interface (GUI).
Key features
Microprocessor control
Embedded software regulates the leak valve and chamber pressure for automated, repeatable cycles.
MicroPirani™ pressure monitoring
An MKS MicroPirani gauge gives accurate vacuum measurement throughout the cycle.
Regulated RF power
Adjusts and monitors 0–20 W RF output at 13.56 MHz for controlled downstream cleaning.
Cycle & purge management
Clock-based timing controls plasma cleaning and nitrogen-purge steps.
Data logging
Records operational and fault events to internal memory.
Remote operation
RS232 (DB9) interface with GUI enables full computer control.
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