Products
UHV Vacuum Chamber Cleaning System
The Evactron U50 De-Contaminator is a compact, high performance yet simplified plasma cleaner for instruments and chambers designed to operate at UHV conditions. The U50 delivers high power cleaning for removal of hydrocarbon contamination on chamber and sample surfaces.
The compact design of the Evactron U50 Plasma Radical Source (PRS) makes it a versatile solution for either instrument chambers, load locks, or sample prep chambers. The Evactron U50 offers fast, effective, and powerful cleaning over a wide range of pressures, enabling hydrocarbon-free RGA spectra and fast pumpdown time to UHV.
75W peak, 50W continuous power output.
Combines plasma and UV afterglow to remove hydrocarbon contamination.
Hollow cathode, capacitive coupled plasma (CCP) technology.
Conflat 2.75 flange and a leak rate below 10⁻¹¹ Torr make it UHV-ready.
Power, cleaning time, cycle count and recipes are all user-programmable.
Withstands bakeout to 150 °C; TMP-compatible with no advance venting.
100×+ faster than earlier Evactron models, with simple push-button operation.
Advanced cleaning using both plasma and UV afterglow.
Patent-pending ignition technology at high vacuum.
Set power, cleaning time, cycles and recipes via a custom remote or tethered touchpad.
Run a range of process gases to tailor the cleaning chemistry to your application.
Operation from 0.3 Pa (2 mTorr) to 80 Pa (600 mTorr).
Optional external interlock connection for safety.
No advance venting needed for operation.
Gas radicals immediately attack hydrocarbon bonds, producing harmless, instantly removed molecules.
Safe for sensitive components with no sputter etch.
Can be installed on a variety of vacuum chambers or load lock.
Simple, automated cleaning initiation.
No match or gas flow adjustments needed for plasma ignition.
RoHS, CE, NRTL, TUV and SEMI S2 compliant.
Talk to our team about the right Evactron® system for your chamber.