Products
SEM & FIB Vacuum Chamber Cleaning System
The Evactron E50 De-Contaminators are compact, high performance yet simplified plasma cleaners for Electron and Ion Beam Instruments such as SEMs, TEMs, and FIBs. The E50 delivers high power cleaning for superior resolution and imaging plus improved detector and probe sensitivity that are compromised by contamination.
The compact design of the Evactron E50 Plasma Radical Source makes it a versatile solution for either SEM/FIB chambers, load locks, or sample prep chambers. The Evactron E50 Plasma Cleaners offer fast, effective, and powerful cleaning over a wide range of pressures enabling high quality, artifact free images and increased efficiency of sample analysis.
The compact design of the Evactron E-Series Plasma Radical Source makes it a versatile solution for either SEM/FIB chambers, load locks, or sample prep chambers. The Evactron E-Series Plasma Cleaners offer fast, effective, and gentle cleaning over a wide range of pressures enabling high quality, artifact free images and increased efficiency of sample analysis.
75W peak, 50W continuous power output.
100X+ faster than earlier generation Evactron models
Advanced cleaning using both plasma and UV afterglow.
Hollow cathode, capacitive coupled plasma (CCP) technology.
Patent-pending ignition technology at high vacuum.
Set power, cleaning time, cycles and recipes via a custom remote or tethered touchpad.
Run a range of process gases to tailor the cleaning chemistry to your application.
Operation from 0.3 Pa (2 mTorr) to 80 Pa (600 mTorr).
Optional external interlock connection for safety.
No advance venting needed for operation.
Safe for sensitive components with no sputter etch.
Can be installed on a variety of vacuum chambers or load lock.
Simple, automated cleaning initiation.
No match or gas flow adjustments needed for plasma ignition.
RoHS, CE, NRTL, TUV and SEMI S2 compliant.