Products
Evactron® E50 ET-C
SEM & FIB Vacuum Chamber Cleaning System
The Evactron E50 De-Contaminators are compact, high performance yet simplified plasma cleaners for Electron and Ion Beam Instruments such as SEMs, TEMs, and FIBs. The E50 delivers high power cleaning for superior resolution and imaging plus improved detector and probe sensitivity that are compromised by contamination.
The compact design of the Evactron E50 Plasma Radical Source makes it a versatile solution for either SEM/FIB chambers, load locks, or sample prep chambers. The Evactron E50 Plasma Cleaners offer fast, effective, and powerful cleaning over a wide range of pressures enabling high quality, artifact free images and increased efficiency of sample analysis.
Precision Plasma, Pristine Chambers
The compact design of the Evactron E-Series Plasma Radical Source makes it a versatile solution for either SEM/FIB chambers, load locks, or sample prep chambers. The Evactron E-Series Plasma Cleaners offer fast, effective, and gentle cleaning over a wide range of pressures enabling high quality, artifact free images and increased efficiency of sample analysis.
System Features
RF Power
75W peak, 50W continuous power output.
Dual Action Cleaning
Advanced cleaning using both plasma and UV afterglow.
Energy Efficient
Hollow cathode, capacitive coupled plasma (CCP) technology.
Pop Ignition
Patent-pending ignition technology at high vacuum.
Programmable & Smart Control
Set power, cleaning time, cycles and recipes via a custom remote or tethered touchpad.
Alternative Gases
Run a range of process gases to tailor the cleaning chemistry to your application.
Wide Pressure Range
Operation from 0.3 Pa (2 mTorr) to 80 Pa (600 mTorr).
External Interlock
Optional external interlock connection for safety.
TMP Compatible
No advance venting needed for operation.
Fast Cleaning
100X+ faster than earlier generation Evactron models
Non-Damaging
Safe for sensitive components with no sputter etch.
Flexible Install
Can be installed on a variety of vacuum chambers or load lock.
Push Button Operation
Simple, automated cleaning initiation.
Auto-Tune
No match or gas flow adjustments needed for plasma ignition.
Certified
RoHS, CE, NRTL, TUV and SEMI S2 compliant.
Evactron® E50 E-TC Alternate Gas De-Contaminator™
The Evactron E50 E-TC Alternate Gas Plasma Cleaner has two configurations: an ultrahigh-purity filter (3nm pore size) version to meet the stringent requirements of the semiconductor industry SEMI F38-0699 directive and the precision filter (0.5µm pore size) version for general lab conditions. The in-line filters prevent the introduction of particulates from gas feedlines into the plasma stream. Alternate gases which have been tested include O2, CDA, Ar/ H2, Ar/O2, N2/H2, N2. The use of 100% H2 is not recommended for safety reasons.
OEM
Evactron® E50 OEM
The Evactron E50-OEM Plasma De-Contaminator was designed for OEM integration for SEM, FIB, high vacuum, and other analytical instruments. This simplified Evactron Plasma Radical Source (PRS) has a small footprint and utilizes air plasma afterglow to reduce hydrocarbon contamination, delivering results quickly and efficiently.