Michael T. Postek and András Vladár , NIST, Gaithersburg, MD Proc SPIE Int. Soc. Opt. Eng. Vol. 9636: 963605 (2015) Abstract: This is the fourth part of a series of tutorial papers discussing various causes of measurement uncertainty in scanned particle beam...
Michael T. Postek, András Vladár and Kavuri P. Purushotham , NIST, Gaithersburg, MD SCANNING Vol. 36: 347-355 (2014) Summary: The scanning electron microscope (SEM) has gone through a tremendous evolution to become indispensable for many and diverse scientific and...
Michael T. Postek and András Vladár , NIST, Gaithersburg, MD SCANNING Vol. 35: 355-361 (2013) Summary: The scanning electron microscope (SEM) has gone through a tremendous evolution to become a critical tool for many and diverse scientific and industrial applications....
András E. Vladár*, Michael T. Postek* and Ronald Vane**, *National Institute of Standards and Technology, Gaithersburg, MD **XEI Scientific, Inc., Redwood City, CA Presentation at SPIE Microlilthography Conference Feb 27-28, 2001; Proc SPIE, Vol. 4344(2001): 835. View...
András E. Vladár, K. P. Purushotham and Michael T. Postek, NIST, Gaithersburg, MD Presented at SPIE Advanced Microlithograpy Feb 2008, San Jose, CA Electron beam-induced contamination is becoming one of the most bothersome problems of the scanning electron...