Active Monitoring and Control of Electron Beam Induced Contamination

András E. Vladár*, Michael T. Postek* and Ronald Vane**, *National Institute of Standards and Technology, Gaithersburg, MD **XEI Scientific, Inc., Redwood City, CA
Presentation at SPIE Microlilthography Conference Feb 27-28, 2001; Proc SPIE, Vol. 4344(2001): 835.