CD-SEMs and Metrology Archives - Evactron®

Influence of Beam Size, Landing Energy, and Charging Effects on the Apparent Diameter of Substrate-Supported Single-Walled Carbon Nanotubes in Scanning Electron Microscopy Imaging

Influence of Beam Size, Landing Energy, and Charging Effects on the Apparent Diameter of Substrate-Supported Single-Walled Carbon Nanotubes in Scanning Electron Microscopy Imaging

Due to the apparent width/diameter broadening common for sub-10 nm features, scanning electron microscopy faces many challenges for nanometrology in silicon-based and emerging carbon nanotube (CNT)-based technologies. The influence of beam size (σbeam), landing energy...

Does Your SEM Really Tell the Truth? – How Would You Know? Part 4

Does Your SEM Really Tell the Truth? – How Would You Know? Part 4

Michael T. Postek and András Vladár , NIST, Gaithersburg, MD Proc SPIE Int. Soc. Opt. Eng. Vol. 9636: 963605 (2015) Abstract: This is the fourth part of a series of tutorial papers discussing various causes of measurement uncertainty in scanned particle beam...

Does Your SEM Really Tell the Truth? – How Would You Know? Part 2

Does Your SEM Really Tell the Truth? – How Would You Know? Part 2

Michael T. Postek, András Vladár and Kavuri P. Purushotham , NIST, Gaithersburg, MD SCANNING Vol. 36: 347-355 (2014) Summary: The scanning electron microscope (SEM) has gone through a tremendous evolution to become indispensable for many and diverse scientific and...

Does Your SEM Really Tell the Truth? – How Would You Know? Part 1

Does Your SEM Really Tell the Truth? – How Would You Know? Part 1

Michael T. Postek and András Vladár , NIST, Gaithersburg, MD SCANNING Vol. 35: 355-361 (2013) Summary: The scanning electron microscope (SEM) has gone through a tremendous evolution to become a critical tool for many and diverse scientific and industrial applications....

Active Monitoring and Control of Electron Beam Induced Contamination

Active Monitoring and Control of Electron Beam Induced Contamination

András E. Vladár*, Michael T. Postek* and Ronald Vane**, *National Institute of Standards and Technology, Gaithersburg, MD **XEI Scientific, Inc., Redwood City, CA Presentation at SPIE Microlilthography Conference Feb 27-28, 2001; Proc SPIE, Vol. 4344(2001): 835. View...

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