For in-situ cleaning of chambers in TEM/STEMs and in-lens SEMs

For all your cleaning needs, the Evactron TEM Wand includes a RF Plasma Radical Source (PRS), Table Top Controller/RF Generator with Automatic Pressure/RF Level Control, RS232 Computer Interface, Solid-state Micropirani Gauge, Cables, Instructions, and a five-year limited warranty.

Features and benefits

• Top of the line plasma cleaner: the most flexible system available with fully adjustable ignition and operating pressures. Starts during pumpdown and is safe for diffusion and turbo pump systems.
• Tabletop controller features easy one-button operation with repeatable, preset plasma conditions via encoder or external computer interface.
• Uses energy efficient capacitively coupled plasma (CCP) and not wasteful inductive coupled plasma (ICP). Stays cool like a CFL (a CCP device) versus a hot tungsten filament bulb
• Dual action cleaning with both plasma and UV afterglow to desorb adventitious hydrocarbons and water vapor.
• Non-damaging to sensitive components – no sputter etch or stripping.
• Gas source is room air for ease of use and low operating cost.
• Installation options: the TEM Wand can be installed on Hitachi or JEOL 200-300kV TEM/STEMS or SEMs configured with a goniometer.
• Five year limited warranty: stringent manufacturing control leads to low failure rate and customer peace of mind.

Specifications

• Electronic Chassis: H, W, D: 5.5″ x 9″ x 7″, (14 x 23 x 19 cm)
• RF Power: 8-12 Watt at 13.56 MHz Capacitively Coupled
• RF Generator stabilized and harmonically suppressed
• LEDs: Power On, Enable switch, RF On, Plasma On, and Fault. LCD for line display.
• Programming library for software integration on your computer platform
• Fixed RF Match mounted on RF feedthrough
• MKS Micro-Pirani Transducer for vacuum measurement
• Mass Flow Controller for flow/pressure adjustment
• Fault display, readout, and log, Serial interface.
• 100-240 VAC 50/60 Hz input, 150 watts
• Shipping 22 lbs. (10 kg.)