Tungsten Probe Tip Cleaning

Tungsten Probe Tip Cleaning

J. Saujauddin, T. Niemi, T. Lundquist, B. Niu, M. Cable ABSTRACT: anoprobing has become indispensable for the characterization of FEOL processes and FinFET performance in early process development and HVM yield improvements [1- 3]. When the processes and transistor...
Plasma Cleaning with Alternate Gases

Plasma Cleaning with Alternate Gases

Ronald Vane, Ewa Kosmowska and Michael Cable ABSTRACT: The Evactron remote plasma cleaner was introduced in 1999 for cleaning SEM chambers and stages with air flowing through a hollow cathode RF plasma that produces oxygen radicals for chemical etching. Since the...
Layer Control of WSe2 via Selective Surface Layer Oxidation

Layer Control of WSe2 via Selective Surface Layer Oxidation

Zhen Li, Sisi Yang, Rohan Dhall, Ewa Kosmowska, Haotian Shi, Ioannis Chatzakis, and Stephen B. Cronin ABSTRACT: We report Raman and photoluminescence spectra of mono- and few-layer WSe2 and MoSe2 taken before and after exposure to a remote oxygen plasma. For bilayer...
The Use of Oxygen in SEM Plasma Cleaning Equipment

The Use of Oxygen in SEM Plasma Cleaning Equipment

Thomas O. Mueller, J. Cowan, and E. Swanson, ON Semiconductor, Gresham Failure Analysis Laboratory, Gresham, OR Poster Presentation at Microscopy and Microanalysis Meeting, August, 2007, Ft. Lauderdale, FL View PDF document here.