The Use of Oxygen in SEM Plasma Cleaning Equipment
Thomas O. Mueller, J. Cowan, and E. Swanson, ON Semiconductor, Gresham Failure Analysis Laboratory, Gresham, OR Poster Presentation at Microscopy and Microanalysis Meeting, August, 2007, Ft. Lauderdale, FL View PDF document here.
Comparing the Effects of Different Gas Mixtures and Vacuum Chamber Geometries on the Evactron Cleaning Process
Christopher G. Morgan and Ronald Vane, XEI Scientific, Inc., Redwood City, CA Poster Presentation at Microscopy and Microanalysis Meeting, August 2008, Albuquerque, NM. Using a quartz crystal microbalance (QCM), the effectiveness of the Evactron® process has been...
Removal of Carbon Contamination using Hydrogen with Low-Power Downstream Plasma Cleaning
C. G. Morgan and R. Vane, XEI Scientific, Inc., Redwood City, CA Poster Presentation at SPIE Advanced Lithography Conference, March 2011, San Jose, CA Carbon contamination on extreme ultraviolet (EUV) optics reduces their reflectivity. The use of a commercially...Upcoming Events
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