Layer Control of WSe2 via Selective Surface Layer Oxidation

Zhen Li, Sisi Yang, Rohan Dhall, Ewa Kosmowska, Haotian Shi, Ioannis Chatzakis, and Stephen B. Cronin ABSTRACT: We report Raman and photoluminescence spectra of mono- and few-layer WSe2 and MoSe2 taken before and after exposure to a remote oxygen plasma. For bilayer...

The Use of Oxygen in SEM Plasma Cleaning Equipment

Thomas O. Mueller, J. Cowan, and E. Swanson, ON Semiconductor, Gresham Failure Analysis Laboratory, Gresham, OR Poster Presentation at Microscopy and Microanalysis Meeting, August, 2007, Ft. Lauderdale, FL View PDF document here.

Comparing the Effects of Different Gas Mixtures and Vacuum Chamber Geometries on the Evactron Cleaning Process

Christopher G. Morgan and Ronald Vane, XEI Scientific, Inc., Redwood City, CA Poster Presentation at Microscopy and Microanalysis Meeting, August 2008, Albuquerque, NM. Using a quartz crystal microbalance (QCM), the effectiveness of the Evactron® process has been...

Removal of Carbon Contamination using Hydrogen with Low-Power Downstream Plasma Cleaning

C. G. Morgan and R. Vane, XEI Scientific, Inc., Redwood City, CA Poster Presentation at SPIE Advanced Lithography Conference, March 2011, San Jose, CA Carbon contamination on extreme ultraviolet (EUV) optics reduces their reflectivity. The use of a commercially...