Christopher G. Morgan and Ronald Vane, XEI Scientific, Inc., Redwood City, CA Paper presented at SPIE Advanced Lithography Conference Feb. 14, 2012, San Jose CA. Many lithographic tools require carbon-free vacuum environments. A commercially available low-power...
Christopher G. Morgan and Ronald Vane, XEI Scientific, Inc., Redwood City, CA Paper presented at SPIE Advanced Lithography Conference Feb. 14, 2012, San Jose CA. Many lithographic tools require carbon-free vacuum environments. A commercially available low-power...
Tom Levesque, Technology Business Consulting and Jezz Leckenby, Talking Science The cleanliness of specimen surfaces and the high vacuum electron microscope environments in which these surfaces are studied or processed have never been more critical than they are today...