Environmental Contamination Sources and Control in High Resolution Scanning Electron Microscopy

Ronald Vane and Vince Carlino, XEI Scientific, Inc., Redwood City, CA Presentation at Microscopy and Microanalysis Meeting, August, 2005, Honolulu, HI Hydrocarbon (HC) background and contamination is hard to avoid in our carbon based world. Even with the most careful...

Immobilization and Removal of Hydrocarbon Contamination Using the Evactron®De-Contaminator

Ronald Vane, XEI Scientific, Inc., Redwood City, CA Presentation at Microscopy and Microanalysis Meeting, July-August, 2006, Chicago, IL Comparison of Residual Gas Analysis results on the removal of volatile components and visual observance of the removal of...

Effect of Cleaning Parameters on Cleaning Effectiveness in a SEM Equipped with an Oxygen Plasma Etching Device

R. Garcia*, A.D. Batchelor*, C.B. Mooney*, A.D. Garetto*, V.L. Carlino**, R. Vane**, and D.P. Griffiths *Materials Science and Engineering Department and Analytical Instrumentation Facility, North Carolina State University, Raleigh, NC; **XEI Scientific, Redwood City,...

Quantification of Contamination Using Quartz Crystal Thickness Monitors

Christopher G. Morgan, Mark M. Gleason and Ronald Vane, XEI Scientific, Inc., Redwood City, CA Poster Presentations at Microscopy and Microanalysis Meeting, August, 2007, Ft. Lauderdale, FL Quartz crystal microbalances (QCMs) are a standard tool for vacuum deposition...

Using Thickness Monitor to Measure Contaminant Removal by Evactron Cleaning as a Function of Operating Parameters

Christopher G. Morgan, Mark M. Gleason and Ronald Vane, XEI Scientific, Inc., Redwood City, CA Poster Presentations at Microscopy and Microanalysis Meeting, August, 2007, Ft. Lauderdale, FL Quartz crystal microbalances (QCMs) are a standard tool for vacuum deposition...