Contamination Specification for Dimensional Metrology SEMs

Contamination Specification for Dimensional Metrology SEMs

András E. Vladár, K. P. Purushotham and Michael T. Postek, NIST, Gaithersburg, MD Presented at SPIE Advanced Microlithograpy Feb 2008, San Jose, CA Electron beam-induced contamination is becoming one of the most bothersome problems of the scanning electron...