Tungsten Probe Tip Cleaning

Tungsten Probe Tip Cleaning

J. Saujauddin, T. Niemi, T. Lundquist, B. Niu, M. Cable ABSTRACT: anoprobing has become indispensable for the characterization of FEOL processes and FinFET performance in early process development and HVM yield improvements [1- 3]. When the processes and transistor...
Plasma Cleaning with Alternate Gases

Plasma Cleaning with Alternate Gases

Ronald Vane, Ewa Kosmowska and Michael Cable ABSTRACT: The Evactron remote plasma cleaner was introduced in 1999 for cleaning SEM chambers and stages with air flowing through a hollow cathode RF plasma that produces oxygen radicals for chemical etching. Since the...