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XEI
Scientific, Inc.
The EVACTRON® De-Contaminator
Updated January 2010 Evactron® Products Page
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on all Products
Evactron®
25, 40 and 45
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Our newest microprocessor controlled systems are simple to operate with easy to customize operating recipes. Press the "Enable" button and the unit will start plasma cleaning in your chamber the next time the pressure is cycled. This occurs by raising the pressure, which restarts evacuation from your instrument's evacuation control system. Downstream Plasma cleaning recipe setup is done either through a computer interface or from the front panel. Settings include cleaning time, nitrogen purging time, plasma vacuum level, RF power level, purging pressure, plasma ignition pressure, and multiple plasma-purge cycles. The RF systems generate 5-20 Watts of RF power for optimum low power cleaning with air. For most users, only the cleaning time is routinely reset. The default settings are normally used for the other parameters. |
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Standard ORS |
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ORS H (high vacuum) |
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ORS U (ultra-high vacuum) |
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Standard ORS <5X10-7 Torr |
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ORS H < 10-8 atm cc/sec |
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ORS U
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Evactron® C |
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XEI
Scientific Evactron® Adaptor Flanges
- Required Accessory for most SEMs.
Sold separately.
PRICING: Contact local distributors for pricing.
See Sales for distribution information.