XEI Scientific, Inc.
The EVACTRON® Anti-Contaminator and De-Contaminator Updated March 2010
Upcoming Shows and Conventions
RF Plasma Cleaning Systems for Electron Microscopes
and High Vacuum Systems
Stops Artifacts and Removes Hydrocarbons and Organics.
See You There!
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Microscopy & Microanalysis (M&M)
Aug 2010
Portland, OR
XEI Scientific, Inc. Booth #1044
Microscopy & Microanalysis
Sponsored by MSA, MAS and IMS
August 1 - 5, 2010 in Portland, Oregon
EXHIBIT Hours
Mon, Aug 2: 12:00 - 5:00 pm
Tues. Aug 3: 9:30 am - 5:30 pm
Wed. Aug 4: 9:30 am - 5:30 pm
Thurs. Aug 5: 9:30 am - 3:00 pm
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ISTFA Convention 2010
Nov 14 - 18, 2010
Dallas, TX
36th International Symposium For Testing And Failure Analysis
Conference: November 14-18, 2010
Exposition: Booth #510
Intercontinental Hotel
Dallas, TX
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Materials Research Society Convention Fall 2010
Nov 29 - Dec 3, 2010
Boston, MA
XEI Scientific, Inc will be at Booth TBA
Exhibit: Nov 30 - Dec 2, 2010
Materials Research Society Convention
Fall 2010 Meeting
Hynes Convention Center (Level 2)
900 Boylston Street
Boston, MA 02115
EXHIBIT HOURS:
Tuesday, November 30: 11:00 am to 5:30 pm
Wednesday, December 1: 11:00 am to 5:30 pm
Thursday, December 2: 10:00 am to 1:30 pm
MRS exhibits provide a unique opportunity to present innovative products and services to a large and diverse global audience who walk the floor seeking technical solutions to their challenges.
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SPIE Advanced Lithography Show 2011
Feb 26 - Mar 4, 2011
San Jose, CA
XEI Scientific, Inc. will be at Table #TBA
Feb 26 - March 4, 2011
TBA
San Jose, California, USA
Exhibition Hours:
TBA
The SPIE Advanced Lithography Symposium is the premier annual international forum bringing practitioners of micro and nanolithography together in a stimulating, informative, and interactive environment.
