XEI Scientific, Inc.
RF Plasma Cleaning Systems for Electron Microscopes
and High Vacuum Systems

The EVACTRON® Anti-Contaminator and De-Contaminator
Stops Artifacts and Removes Hydrocarbons and Organics.

Updated August 2007


Evactron 45


New Evactron®45 D-C Rackmounted Model

Evactron 45 .pdf

XEI Scientific introduces our exciting new Evactron® 45 De-Contaminator (D-C) for cleaning scanning electron microscopes. We're pushing the frontiers electron microscope cleaning technology to improve resolution and imaging time for 21st century needs.

Evactron® D-C cleaning uses a unique, cutting edge process for remote plasma production of oxygen radicals that flow downstream through your system, removing hydrocarbons.

Our new user friendly Evactron® D-C models optimize remote plasma cleaning perfectly to the needs of the user.

  • Uses air, no special gases needed

  • Easy to operate and setup

  • Start cleaning by using vent and evacuation controls for chamber

  • Uses preset pressure, power, and time settings from front panel or computer interface

  • Plasma and nitrogen purge cleaning can be combined in cycles for maximum cleaning efficiency

  • Advanced plasma detection logic

  • Cleaning and error logs record cleaning history and aids trouble shooting

  • Electronic Chassis: H 3.5" x W 19.5" x D 7"
  • RF Power: 5 - 20 Watts at 13.566 MHz
  • KF 40 vacuum mounting flange
  • 100-240 VAC 50/60 Hz input